3 статьи c Journal of Vacuum Science and Technology B

[Levitan]

Уважаемые коллеги, пожалуйста, помогите со статьями:

J. Vac. Sci. Technol. B 30, 06F308 (2012);
http://dx.doi.org/10.1116/1.4767447 (8 pages)
Fast simulation of stochastic exposure distribution in electron-beam lithography
Xinyu Zhao1, Soo-Young Lee1, Sang-Hee Lee2, Byung-Gook Kim2, and Han-Ku Cho2

J. Vac. Sci. Technol. B 29, 06F311 (2011);
http://dx.doi.org/10.1116/1.3656343 (6 pages)
Experimental evaluation method of point spread functions used for proximity effects correction in electron beam lithography
Bengt A. Nilsson

J. Vac. Sci. Technol. B 29, 06F902 (2011);
http://dx.doi.org/10.1116/1.3650696 (7 pages)
Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography
S.-Y. Lee1, Q. Dai1, S.-H. Lee2, B.-G. Kim2, and H.-K. Cho2

Заранее большое спасибо!