1. Oxidation behavior of titanium nitride films.
Journal of Vacuum Science & Technology A.
Author(s): Chen, Hong-Ying; Lu, Fu-Hsing
Volume: 23 , Issue: 4 Page(s): 1006 - 1009
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http://dx.doi.org/10.1116/1.1914815Journal of Vacuum Science & Technology A.
Author(s): Munz, Wolf‐Dieter
Volume: 4 , Issue: 6 Page(s): 2717 - 2725
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http://dx.doi.org/10.1116/1.573713