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1. Precursors and operating conditions for the metal-organic chemical vapor deposition of nickel films.
Laurent Brissonneaua, Constantin Vahlas
Annales de Chimie Science des Matériaux, Volume 25, Issue 2, February 2000, Pages 81-90

DOI:

http://dx.doi.org/10.1016/S0151-9107(00)88716-4

2. Catalytically enhanced H2-free CVD of transition metals using commercially available precursors
N. Bahlawanea, P. Antony Premkumara, K. Onwukaa, K. Rottb, G. Reissb, K. Kohse-Höinghaus
Surface and Coatings Technology,Volume 201, Issues 22-23, 25 September 2007, Pages 8914-8918, Euro CVD 16

DOI:

http://dx.doi.org/10.1016/j.surfcoat.2007.04.047

3. Morphology analysis of nickel thin films grown by MOCVD
Michael Becht, Fachri Atamnyb, A. Baikerb, Klaus-Hermann Dahmen
Surface Science, Volume 371, Issues 2-3, 1 February 1997, Pages 399-408

DOI:

http://dx.doi.org/10.1016/S0039-6028(96)01015-1

4. Synthesis, crystal structures and thermal behavior of Ni(pda)(hfac)2 and Ni(pda)(thd)2 as potential MOCVD precursors (pda-1,3-diaminopropane, hfac-1,1,1,5,5,5-hexafluoro-2,4-pentanedionato(-), thd-2,2,6,6-tetrametyl-3,5-heptanedionato(-))
S.I. Dorovskikh, E.A. Bykova, N.V. Kuratieva, L.N. Zelenina, Yu.V. Shubin, N.B. Morozova, , I.K. Igumenov
Journal of Organometallic Chemistry, In Press, Accepted Manuscript - Note to users

DOI:

http://dx.doi.org/10.1016/j.jorganchem.2011.10.020

5. Effect of catalyst for nickel films for NiSi formation with improved interface roughness
Hee-Sung Kanga, Jong-Bong Hab, Jung-Hee Leea, Chi Kyu Choic, Jeong Yong Leed, Kwang-Man Lee
Thin Solid Films, Volume 519, Issue 20, 1 August 2011, Pages 6658-6661
10th Asia-Pacific Conference on Plasma Science and Technology

DOI:

http://dx.doi.org/doi:10.1016/j.tsf.2011.04.081

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