Edmond J.A., Davis R.F., Withrow S.P., More K.L. - Ion implantation in beta-SiC: Effect of channeling direction and critical energy for amorphization. // Journal of Materials Science. 1988. V. 3. N. 2. P. 321 - 328.
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http://dx.doi.org/10.1557/JMR.1988.0321
