High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes.
Volume 24. Issye 3. 2020. 193-200.
J. Musil, R. Gerstwy, A.D. Pogrebnjak
Thermal Stability of Hard Tantalum Boride Films.
- DOI:
http://dx.doi.org/10.1615/HighTempMatProc.2020035911